Tas Part H116 Premises for electro-plating, electro-polishing, anodising or etching
Tas H116.1 Application of Part
This Part is applicable to every building where any of the processes of electro-plating, electro-polishing, anodising or etching are undertaken.
Premises for electro-plating, electro-polishing, anodising or etching must—
provide for the safety and comfort of workers; and
be constructed in a manner that will prevent the escape of liquids and atmospheric contaminants to other areas of the building.
Tas H116.2 Floors
The floor of every plating area must be—
so graded as to—
permit easy flushing with water; and
prevent liquids from flowing from the area into other parts of the work place; and
chemically resistant to the solutions used in the process.
Tas H116.3 Height of plating area
Every part of a plating area must be not less than 2.7 m in height—
measured from the floor to the ceiling if a ceiling is provided; or
measured from the floor to the lowest part of the roof if a ceiling is not provided.
Tas H116.4 Air space
In every plating area there must be not less than 14 m3 of air space for each person employed and, in the calculation of such space, the height taken into account must not exceed 4.2 m.
Tas H116.5 Ceiling construction
The ceiling of a plating area must be so constructed as to prevent, so far as is practicable, atmospheric contaminants from escaping into rooms or work places, situated above the level of the ceiling.